High Purity Zirconium Sputtering Target

Introduction and preparation process of zirconium target   Zirconium target is a material used in coating processes such as ion beam sputtering deposition and electron beam evaporation. It has good chemical stability and high temperature performance and is widely used in optics, electronics, aerospace and other fields. Zirconium target is mainly made of high-quality zirconium alloy or stainless steel material, with the characteristics of high purity, high density and high strength. Its coating part requires high stability, high wear resistance and high reflectivity.   The preparation method of zirconium target includes a variety of processes. Common preparation methods include vacuum melting, hot isostatic pressing, electron beam melting and plasma spin coating. These methods have their own advantages and disadvantages. For example, vacuum melting can avoid oxidation and impurities, ensuring the high purity of the target, while hot isostatic pressing can produce high-density…

Niobium Metal Zirconium Metal Tungsten Alloy Molybdenum Alloy Pure Tungsten